Table of Prototype Facility equipment
|
Number |
Equipment |
Type/Code |
Description |
Image |
|---|---|---|---|---|
| 1 | Cleanroom(Cleanroom) | LCM-CL | The 2,500 sq. ft. clean room space houses a series of equipment necessary for prototyping advanced liquid crystal, micro- and nano- structured devices. | |
| 2 | Oriel Mask Aligner (Aligner) | Oriel-UV | Oriel Mask aligner for 7" mask / 6" substrate |  |
| 3 | Photolith Bench 7" (Photolith Bench) | Photo-7" | Wet bench for up to 7" substrate size; develop / etch / strip |  |
| 4 | VPI Scriber (VPI) | VPI-GS210 | Villa Precision Automated Glass Scriber |  |
| 5 | Brewer Spincoater 7" (Brewer Sci Spinner) | BSci-Cee-7" | Brewer Science spincoater for up to 7" glass |  |
| 6 | Spacer Sprayer | NEB-1 | Spacer Sprayer, including nebulizer and enclosure |  |
| 7 | NuArc UV Exposure Tool (NuArc 1) | NuArc | NuArc UV Exposure Tool |  |
| 8 | ElectroLite UV (EL-UV) | EL-UV | ElectroLite portable UV source for adhesive curing |  |
| 9 | JA Woollam Spectroscopic Ellipsometer | JAW-ELLIPSE | JA Woollam Co Spectroscopic Ellopsometer |  |
| 10 | LC Technologies Vac Fill Chamber | LC-Fill-1 | LC Technologies vacuum filling chamber ("foosball" chamber) |  |
| 11 | MRC Sputter Coater (MRC Sputter) | MRC-603III | MRC 603III sputter coater for deposition of SiO2, ITO, Ni |  |
| 12 | Blue M PI Bake Oven (OVEN-2) | OVEN-2 | Blue M HEPA oven for PI bake, 240C max temp |  |
| 13 | Solitec Spincoater (Solitec) | Sol-Spin | Solitec spincoater for up to 7"x7" substrate size |  |
| 14 | Ceramic vacuum chuck 12" (vac-chuck 12) | vac_chuck_12 | Photomachining 12" ceramic vacuum chuck for cell assembly |  |
| 15 | Zenith Ultrasonic Tank (Zenith U/S) | Z-U/S | Zenith Ultrasonic Tank Cleaner |  |
| 16 | VWR PI Bake Oven (OVEN-1) | OVEN-1 | VWR oven 300C max temp |  |
| 17 | Asymtek XY dispenser (Asymtek 1) | XYDispense-1 | Asymtek A403 Programmable Dispenser. |  |
| 18 | Wet Bench: Glass Cleaning (GC Wet Bench) | WB-GC | Glass cleaning wet bench |  |
| 19 | Bell Jar Filling Chamber (Bell Jar Fill) | BJ-Fill | Bell Jar vacuum fill chamber |  |
| 20 | End Seal Press (ESP) | ESP-12 | LC Technologies 12" End Seal Press |  |
| 21 | Inkjet Printer (Inkjet) | Dimatix | Dimatix desktop inket printer |  |
| 22 | DekTak Profilometer (DekTak) | Dek | DekTak 3030 profilometer |  |
| 23 | Kurt Lesker Thermal Evaporator (SiOx Evaporator) | SiOx Evap | Kurt Lesker Thermal evaporator for oblique SiOx alignment layer deposition; in Room 178 |  |
| 24 | Tencor Profilometer (Tencor) | TENCOR PROF | Tencor stylus profilometer, located in AFM Lab (Rm 109 LCM) |  |
| 25 | Headway Spincoater 14" (Headway spinner) | HEADWAY-SPIN | Headway Research spincoater for up to 14" substrate size |  |
| 26 | TNP Instruments Laser Repair Station (Laser Repair) | TNP-Laser | Laser ablation for ITO short repair |  |
| 27 | UVOCS UV-ozone Cleaner 1 (UVOCS-1) | UVozone-1 | UVOCS UV-ozone cleaner for advanced user area |  |
| 28 | Karl Suss Mask Aligner (Karl Suss) | Clean room | Photomask aligner and UV exposure tool, collimated light |  |
| 29 | LC Tex/Hornell Rub Machine (Hornell Rub) | Hornell | LC Tec/Hornell Automation Rub Machine for 7" or 14" glass |  |
| 30 | Asymtek2 Gasket Dispense (Asymtek2) | Cleanroom | Gasket dispense for front room prototyping circuit |  |
| 31 | Laurell Spin Coater1 (resist) | SC1-PR | Laurell Spin Coater for Photoresist in front room 4" plates and smaller |  |
| 32 | Laurel Spin Coater2 (polyimide) | SC2-PI | Laurell Spin Coater for Photorsist in front room 4" plates and smaller |  |
| 33 | Temescal e-beam deposition (Temescal) | Temescal | e-beam metal deposition coater in Standard Processes room of LCI Cleanroom |  |
| 34 | Reactive Ion Etcher (RIE) | RIE | Reactive Ion Etcher machine for removal of organic films |  |
| 35 | 4" Cleaning (4"-Zone1) | 4"-Cleaning | Branson Ultrasonic, Wet Bench 4, Drying Oven | |
| 36 | Q-Sun Xenon Test Chamber (Q-Sun) | Q-Sun | Q-Sun Zenon Test Chamber / Solar Simulator |  |